62 static constexpr double table[4][3] = {
64 {800., 6.0e16 / 36000., 120e-30},
65 {900., 3.1e16 / 36000., 130e-30},
66 {1000., 5.0e15 / 36000., 170e-30},
67 {1100., 1.1e15 / 36000., 350e-30}};
68 const double inverse = 1. / (temperatureCelsius + 273.15);
70 while (k < 2 && temperatureCelsius > table[k + 1][0])
72 const double i0 = 1. / (table[k][0] + 273.15);
73 const double i1 = 1. / (table[k + 1][0] + 273.15);
74 const double w = (inverse - i0) / (i1 - i0);
75 const double wT = std::clamp((temperatureCelsius - table[k][0]) /
76 (table[k + 1][0] - table[k][0]),
81 params.
viscosity = std::exp((1. - w) * std::log(table[k][1]) +
82 w * std::log(table[k + 1][1]));
84 (1. - wT) * table[k][2] + wT * table[k + 1][2];
Definition lsAdvect.hpp:41
Nitride (Si₃N₄) mask of the LOCOS process. The grid points inside the mask join the oxide mechanics s...
Definition lsOxidationMask.hpp:18
double poissonRatio
Definition lsOxidationMask.hpp:22
double shearActivationVolume
Definition lsOxidationMask.hpp:27
double viscosity
Definition lsOxidationMask.hpp:26
double youngModulus
Definition lsOxidationMask.hpp:21
Parameters for the steady oxidant diffusion model used by OxidationDiffusion.
Definition lsOxidationDiffusion.hpp:56
double transferCoefficient
Definition lsOxidationDiffusion.hpp:59
double temperature
Definition lsOxidationDiffusion.hpp:74
double reactionActivationVolume
Definition lsOxidationDiffusion.hpp:75
double diffusionActivationVolume
Definition lsOxidationDiffusion.hpp:80
double diffusionCoefficient
Definition lsOxidationDiffusion.hpp:57
double reactionRate
Definition lsOxidationDiffusion.hpp:58
double oxidantMoleculeDensity
Definition lsOxidationDiffusion.hpp:61
double equilibriumConcentration
Definition lsOxidationDiffusion.hpp:60
double expansionCoefficient
Definition lsOxidationDiffusion.hpp:62
Named parameter presets for common thermal oxidation processes.
Definition lsOxidationPresets.hpp:24
static OxidationMaskParameters siliconNitrideMask(double temperatureCelsius)
LPCVD Si3N4 mask: E = 270 GPa, nu = 0.27, and Maxwell creep with an Eyring viscosity from Senez et al...
Definition lsOxidationPresets.hpp:61
static OxidationMaskParameters siliconNitrideMask1000C()
Definition lsOxidationPresets.hpp:87
static OxidationDeformationParameters oxideMechanics1000C(double timeStep)
Thermal SiO2 viscoelastic mechanics at 1000 °C. Viscosity ~1×10¹⁰ Pa·hr (Irene 1978),...
Definition lsOxidationPresets.hpp:45
static OxidationParameters wet1000CDealGrove100()
Wet oxidation at 1000 °C (Deal-Grove linear-parabolic coefficients). B/2 = D_eff = 0....
Definition lsOxidationPresets.hpp:28