ViennaPS

Process Simulation Library

ViennaPS is a header-only C++ process simulation library, which includes surface and volume representations, a ray tracer, and physical models for the simulation of microelectronic fabrication processes. This library seamlessly integrates advanced level-set functionalities with top-down Monte Carlo flux calculations, powered by state-of-the-art ray tracing techniques. This combination brings a new level of accuracy and efficiency to process simulations, empowering engineers and researchers to model complex systems.

ViennaPS is under heavy development and improved daily. If you do have suggestions or find bugs, please let us know on GitHub or contact us directly at viennatools@iue.tuwien.ac.at!

This documentation serves as your comprehensive guide to understanding, implementing, and harnessing the capabilities of our process simulation library. Whether you are a seasoned researcher seeking to refine your simulations or an engineer aiming to optimize real-world processes, this library provides a versatile and robust platform to meet your diverse needs.

Throughout this documentation, you will find detailed explanations, practical examples, and best practices to effectively utilize the library. We aim to empower users with the knowledge and tools necessary to simulate a wide range of processes accurately and efficiently, making informed decisions and driving innovation in the field.

Contributing

If you want to contribute to ViennaPS, make sure to follow the LLVM Coding guidelines.

Make sure to format all files before creating a pull request:

cmake -B build
cmake --build build --target format

About the project

ViennaPS was developed under the aegis of the Institute for Microelectronics at the TU Wien.

Current contributors: Tobias Reiter, Noah Karnel, Julius Piso, Lado Filipovic

License

See file LICENSE in the base directory.