Oxide Regrowth
#include <psOxideRegrowth.hpp>
Modelling of oxide regrowth in during selective etching in stack of alternation SiO2 and Si3N4 layers. Based on the model presented here1.
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Tobias Reiter, Alexander Toifl, Andreas Hössinger, Lado Filipovic; Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures. in: 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2023, pp 85–88. https://doi.org/10.23919/SISPAD57422.2023.10319506 ↩