Oxide Regrowth

#include <psOxideRegrowth.hpp>

Modelling of oxide regrowth in during selective etching in stack of alternation SiO2 and Si3N4 layers. Based on the model presented here1.


  1. Tobias Reiter, Alexander Toifl, Andreas Hössinger, Lado Filipovic; Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures. in: 2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) 2023, pp 85–88. https://doi.org/10.23919/SISPAD57422.2023.10319506