Oxide Regrowth 

#include <psOxideRegrowth.hpp>

OxideRegrowth models oxide regrowth during selective etching of alternating SiO2 and Si3N4 stacks. The model combines selective etching, byproduct dynamics, diffusion, and redeposition through a velocity field and advection callback.

It is based on the model presented in Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures.

Constructor 

OxideRegrowth(NumericType nitrideEtchRate,
              NumericType oxideEtchRate,
              NumericType redepositionRate,
              NumericType reDepositionThreshold,
              NumericType redepositionTimeInt,
              NumericType diffusionCoefficient,
              NumericType sinkStrength,
              NumericType scallopVelocity,
              NumericType centerVelocity,
              NumericType topHeight,
              NumericType centerWidth,
              NumericType timeStabilityFactor = 0.245)
Parameter Description
nitrideEtchRate Etch rate for nitride regions.
oxideEtchRate Etch rate for oxide regions.
redepositionRate Rate used for oxide redeposition.
reDepositionThreshold Byproduct threshold above which redeposition is enabled.
redepositionTimeInt Time interval used by the redeposition model.
diffusionCoefficient Diffusion coefficient for byproduct transport.
sinkStrength Strength of the byproduct sink term.
scallopVelocity Velocity contribution controlling scallop evolution.
centerVelocity Velocity contribution around the stack center.
topHeight Height of the top reference region.
centerWidth Width of the center region. Internally, half of this value is used.
timeStabilityFactor Stability factor for the callback time stepping.

Example Usage

C++

 
auto model = SmartPointer<OxideRegrowth<NumericType, D>>::New(
    nitrideEtchRate, oxideEtchRate, redepositionRate,
    reDepositionThreshold, redepositionTimeInt, diffusionCoefficient,
    sinkStrength, scallopVelocity, centerVelocity, topHeight, centerWidth);

Python

 
model = vps.OxideRegrowth(
    nitrideEtchRate, oxideEtchRate, redepositionRate,
    reDepositionThreshold, redepositionTimeInt, diffusionCoefficient,
    sinkStrength, scallopVelocity, centerVelocity, topHeight, centerWidth
)